Kang, H. -M. Jeong, J. -H. Park, J. -K. Lee, K. -S. Kim, W. M. Choi, H. -J. Baik, Y. -J. 2024-01-20T15:04:06Z 2024-01-20T15:04:06Z 2021-09-04 2012-04 1533-4880 https://pubs.kist.re.kr/handle/201004/129410 The effect of precursor ratio (H2O/DEZ) on the texture orientation, surface morphology, optical transparency and electrical resistivity of ZnO thin films deposited by MOCVD was investigated. Deposition temperature and pressure were fixed at 120 degrees C and 0.67 torr, respectively. The precursor ratio was varied between 0.1 and 4. It was found that the texture orientation changed from < 0002 > to < 1120 > with increase of the precursor ratio. < 1120 > textured film shows well facetted tetrapod like rough surface morphology, which scatters the incident light very effectively. The electrical resistivity was in the range of about 0.1 Omega cm in the undoped state, which was found to decrease with increase of the film thickness and decrease of the precursor ratio. English AMER SCIENTIFIC PUBLISHERS CHEMICAL-VAPOR-DEPOSITION SOLAR-CELLS Effect of Precursor Ratio on the Structural Properties of ZnO Thin Films Deposited by Low Pressure MOCVD Article 10.1166/jnn.2012.5631 1 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.4, pp.3669 - 3672 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 12 4 3669 3672 scie scopus 000305850900144 2-s2.0-84863321913 Chemistry, Multidisciplinary Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter Chemistry Science & Technology - Other Topics Materials Science Physics Article; Proceedings Paper CHEMICAL-VAPOR-DEPOSITION SOLAR-CELLS ZnO Thin Film Texture Light Trapping Solar Cell