Choo, Sung Joong Park, Jung Ho Lee, Sangyoup Shin, Hyun-Joon 2024-01-20T15:05:20Z 2024-01-20T15:05:20Z 2021-09-05 2012-03 0374-4884 https://pubs.kist.re.kr/handle/201004/129459 An integrated Mach-Zehnder interferometric chip operating at 632.8 nm was designed and fabricated using planar rib waveguide technology for optical sensor applications. A rib waveguide with a silicon-oxynitride core layer and silicon-oxide clad layers was geometrically designed to have a single-mode operation and a high surface sensitivity by using an effective index method. A chromium mask layer was employed as an etch stop to protect the core layer of the rib waveguide and was patterned using an image reversal process with a photo mask applied to the sensor zone. The image reversal process was modified in order to obtain a longer chromium mask layer against the sensor zone. We have, therefore, established a fabrication method for an integrated Mach-Zehnder interferometric sensor without the addition of a new photo mask. The optical measurement with this device for a mixture of deionized water (DIW) and phosphate buffer solution (PBS) finally showed a sensitivity of about pi/(6.25 x 10(-4)). English KOREAN PHYSICAL SOC An Integrated Mach-Zehnder Interferometric Sensor Fabricated by Using Cr Mask Extension Lithography Article 10.3938/jkps.60.744 1 JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.60, no.5, pp.744 - 749 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 60 5 744 749 scie scopus kci ART001642927 000304099600013 2-s2.0-84859984008 Physics, Multidisciplinary Physics Article Mach-Zehnder interferometric chip Rib waveguide Silicon-oxynitride Chromium mask layer Image reversal process