Nguyen Si Hieu Lim, Jong Choo Lee, Joong Kee 2024-01-20T15:33:45Z 2024-01-20T15:33:45Z 2021-09-05 2012-01 0167-9317 https://pubs.kist.re.kr/handle/201004/129661 A Si thick film with a thickness of ca. 2 mu m was deposited on a copper substrate by electron cyclotron resonance-chemical vapor deposition (ECR-CVD) under a mixture of silane (SiH(4)) and argon (Ar) gases. The surface modification of the silicon anode was carried out by the metal-assisted chemical etching method. Observation by SEM showed that the silicon on the copper substrate had a nanorod structure as the result of the etching process. The electrochemical performance of the anode prepared using the free-standing Si nanorods showed a specific capacity of more than 2000 mAh/g with 84% of the discharge capacity remaining ever after 25 cycles of charge and discharge, as compared with 35% of the discharge capacity remaining for the pristine Si thick film. (C) 2011 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE BV NANOWIRE ARRAYS LASER-ABLATION SI NANOWIRES FABRICATION ELECTRODES MECHANISM Free-standing silicon nanorods on copper foil as anode for lithium-ion batteries Article 10.1016/j.mee.2011.03.142 1 MICROELECTRONIC ENGINEERING, v.89, pp.138 - 140 MICROELECTRONIC ENGINEERING 89 138 140 scie scopus 000299407000034 2-s2.0-81855213139 Engineering, Electrical & Electronic Nanoscience & Nanotechnology Optics Physics, Applied Engineering Science & Technology - Other Topics Optics Physics Article; Proceedings Paper NANOWIRE ARRAYS LASER-ABLATION SI NANOWIRES FABRICATION ELECTRODES MECHANISM Lithium-ion battery anode Silicon nanorod Metal-assisted chemical etching