Oh, Dohyun No, Young Soo Kim, Su Youn Cho, Woon Jo Kwack, Kae Dal Kim, Tae Whan 2024-01-20T17:33:34Z 2024-01-20T17:33:34Z 2021-09-02 2011-02-03 0925-8388 https://pubs.kist.re.kr/handle/201004/130648 Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40 nm-CuAlO2/18 nm-Ag/40 nm-CuAlO2 multilayer films was 2.8 x 10(-5) Omega cm, and the transmittance of the multilayer films with an Ag film thickness of 8 nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells. (C) 2010 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA PULSED-LASER DEPOSITION THIN-FILMS TRANSPARENT FABRICATION COATINGS DIODE Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates Article 10.1016/j.jallcom.2010.10.180 1 JOURNAL OF ALLOYS AND COMPOUNDS, v.509, no.5, pp.2176 - 2179 JOURNAL OF ALLOYS AND COMPOUNDS 509 5 2176 2179 scie scopus 000287167700158 2-s2.0-78651353930 Chemistry, Physical Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering Chemistry Materials Science Metallurgy & Metallurgical Engineering Article PULSED-LASER DEPOSITION THIN-FILMS TRANSPARENT FABRICATION COATINGS DIODE Oxide materials Thin films Electronic properties Optical properties Atomic force microscopy AFM X-ray diffraction