Lee, Yeonhee Lee, Jihye Lim, Weon Cheol Shin, Kwanwoo Kim, Kang-Jin 2024-01-20T18:00:49Z 2024-01-20T18:00:49Z 2021-09-05 2011-01 0142-2421 https://pubs.kist.re.kr/handle/201004/130750 The morphology from symmetric diblock copolymers of poly(styrene-b-propylmethacrylate) (PS-PPrMA), where polystyrene (PS) block was perdeuterated near the copolymer/air and copolymer/substrate interfaces and in the bulk, was characterized by using time-of-flight secondary ion mass spectrometry (TOF-SIMS). Elemental depth profiles measured in the negative ion mode by a Cs+ primary ion beam demonstrate variations in hydrogen, deuterium, carbon, oxygen and hydrocarbons within the diblock copolymer according to the depth. The annealed deuterated poly(styrene-b-propylmethacrylate) (dPS-PPrMA) copolymer samples showed a decrease in the deuterated PS secondary ion peak intensity as compared to the as-cast samples. TOF-SIMS depth profiling was obtained for the lamellar morphology of dPS-PPrMA which is found to orient parallel to the surface of the substrate. This preferential orientation resulted in a periodic variation in the composition of each block that continued through the entire copolymer film with thickness of 700 and 2100 angstrom. Temperature-dependent annealing studies on dPS-PPrMA thin film on the silicon substrates were performed to investigate the lower critical ordering transition (LCOT) properties of diblock copolymers. Copyright (C) 2010 John Wiley & Sons, Ltd. English WILEY-BLACKWELL ION MASS-SPECTROMETRY POLYMER THIN-FILMS BLOCK-COPOLYMERS X-RAY SURFACE AFM ORIENTATION MORPHOLOGY SUBSTRATE BEHAVIOR Depth profiling of lamella-phase diblock copolymers using SIMS Article 10.1002/sia.3511 1 SURFACE AND INTERFACE ANALYSIS, v.43, no.1-2, pp.277 - 280 SURFACE AND INTERFACE ANALYSIS 43 1-2 277 280 scie scopus 000287669500070 2-s2.0-78951475282 Chemistry, Physical Chemistry Article; Proceedings Paper ION MASS-SPECTROMETRY POLYMER THIN-FILMS BLOCK-COPOLYMERS X-RAY SURFACE AFM ORIENTATION MORPHOLOGY SUBSTRATE BEHAVIOR depth profiling diblock copolymer phase separation TOF-SIMS PS PPrMA