Cho, Nam Gyu Seo, Hyungtak Kim, Dong Hun Kim, Ho-Gi Kim, Jinwoo Kim, Il-Doo 2024-01-20T18:01:44Z 2024-01-20T18:01:44Z 2021-09-02 2011-01 1099-0062 https://pubs.kist.re.kr/handle/201004/130795 Significantly reduced leakage current characteristics of the Bi1.5Zn1.0Nb1.5O7 (BZN) gate dielectric for producing high-performance ZnO-thin film transistors (TFTs) were achieved by an addition of MgO (30 atom %). The overall TFT parameters using MgO-BZN gate insulator against those that used pure BZN dielectric were enhanced remarkably. The diphasic MgO-BZN composite oxide structure was confirmed by an analysis of the spectroscopically detected bandedge electronic structures. The bandgap energy of MgO-BZN was identical to that of BZN at similar to 3.3 eV, but the Fermi energy level was shifted to 1.2 eV from 0.6 eV for BZN against the valence bandedge. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3508481] All rights reserved. English ELECTROCHEMICAL SOC INC OXIDE SEMICONDUCTORS TRANSPARENT INSULATOR Characterization on Bandedge Electronic Structure of MgO Added Bi1.5Zn1.0Nb1.5O7 Gate Dielectrics for ZnO-Thin Film Transistors Article 10.1149/1.3508481 1 ELECTROCHEMICAL AND SOLID STATE LETTERS, v.14, no.1, pp.G4 - G7 ELECTROCHEMICAL AND SOLID STATE LETTERS 14 1 G4 G7 scie scopus 000284317600013 2-s2.0-78751485899 Electrochemistry Materials Science, Multidisciplinary Electrochemistry Materials Science Article OXIDE SEMICONDUCTORS TRANSPARENT INSULATOR