Wi, Jung-Sub Lim, Kipil Kim, Tae Wan Choi, Sang-Jun Shin, Kyung-Ho Kim, Ki-Bum 2024-01-20T18:34:34Z 2024-01-20T18:34:34Z 2021-09-01 2010-09 0304-8853 https://pubs.kist.re.kr/handle/201004/131163 Multilayered Co/Pd nano-dot arrays with pitches varying from 100 to 25 nm were obtained using an electron beam lithography and plasma etching process. The proximity effect in the lithography step and redeposition phenomenon in the etching step was minimized by modifying the resist development method and plasma etching parameters. For the array with a pitch of 100 nm, the ferromagnetic single domain behavior of each Co/Pd nano-dot was confirmed by magnetic force microscopy at room temperature. In addition, its magnetization, coercivity, and switching field distribution were also evaluated quantitatively using an alternating gradient magnetometer. (C) 2010 Elsevier B.V. All rights reserved. English ELSEVIER PERPENDICULAR MAGNETIC-ANISOTROPY HYDROGEN SILSESQUIOXANE PD/CO Fabrication of multilayered Co/Pd nano-dot array with an areal density of 1 tera-dot/in(2) Article 10.1016/j.jmmm.2010.03.025 1 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.322, no.17, pp.2585 - 2588 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 322 17 2585 2588 scie scopus 000277700600027 2-s2.0-77953323136 Materials Science, Multidisciplinary Physics, Condensed Matter Materials Science Physics Article PERPENDICULAR MAGNETIC-ANISOTROPY HYDROGEN SILSESQUIOXANE PD/CO Pattened magnetic media Co/Pd multilayer Electron-beam lithography