Yuk, J. M. Lee, J. Y. Kim, Y. No, Y. S. Kim, T. W. Choi, W. K. 2024-01-20T18:34:55Z 2024-01-20T18:34:55Z 2021-09-04 2010-08-09 0003-6951 https://pubs.kist.re.kr/handle/201004/131180 High-resolution transmission electron microscopy and energy dispersive x-ray spectroscopy results showed that metallic Zn nanodots (NDs) were fabricated through transformation of ZnO thin films by deposition of SiO(x) on ZnO/n-Si (100) heterostructures. The Zn NDs with various sizes and densities were formed due to the occurrence of the mass diffusion of atoms along the grain boundaries in the ZnO thin films. The fabrication mechanisms of metallic Zn NDs through transformation of ZnO thin films deposited on n-Si substrates are described on the basis of the experimental results. (C) 2010 American Institute of Physics. [doi:10.1063/1.3475016] English AMER INST PHYSICS QUANTUM-DOT LASER ELECTROLUMINESCENCE Formation mechanisms of metallic Zn nanodots by using ZnO thin films deposited on n-Si substrates Article 10.1063/1.3475016 1 APPLIED PHYSICS LETTERS, v.97, no.6 APPLIED PHYSICS LETTERS 97 6 scie scopus 000280940900020 2-s2.0-77955760072 Physics, Applied Physics Article QUANTUM-DOT LASER ELECTROLUMINESCENCE atomic force microscopy diffusion grain boundaries nanofabrication nanostructured materials sputter etching transmission electron microscopy X-ray chemical analysis zinc