Park, Jong S. Kim, Hyung-jun 2024-01-20T20:04:06Z 2024-01-20T20:04:06Z 2021-09-04 2009-12-15 0169-4332 https://pubs.kist.re.kr/handle/201004/131881 We report the use of the time-of-flight secondary ion mass spectrometry (ToF-SIMS) technique to determine whether the patterned bank is suitable for inkjet printing, by evaluating the phobicity contrast between two regions, the glass substrate inside pixels and the surface of the resist bank. We first examined the effect of plasma treatment on the ink spreading behavior inside pixels. The phobicity contrast was optimized by removing residues inside the pixels and by providing high phobicity on the bank surface. We show that ToF-SIMS spectra and mass-resolved images are effective tools in examining the existence of organic contaminants inside pixels and predicting the actual inkjet printing behavior. The ToF-SIMS technique will find promising applications that are related to surface characteristics where conventional contact angle measurement is hard to apply due to geometrical and technical restrictions. (C) 2009 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE BV COLOR FILTER ELECTRONICS POLYMER FILMS INKS ADHESION Surface characterization of plasma-modified resist patterns by ToF-SIMS analysis Article 10.1016/j.apsusc.2009.09.028 1 APPLIED SURFACE SCIENCE, v.256, no.5, pp.1604 - 1608 APPLIED SURFACE SCIENCE 256 5 1604 1608 scie scopus 000272345400061 2-s2.0-70849090002 Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Article COLOR FILTER ELECTRONICS POLYMER FILMS INKS ADHESION Plasma Inkjet ToF-SIMS Resist Bank Pixel