알렉산더 호딘 Lee, Joong-Kee Kim, Chang-Sam Kim, Sang Ok 2024-01-20T20:05:18Z 2024-01-20T20:05:18Z 2021-09-04 2009-12 0167-577X https://pubs.kist.re.kr/handle/201004/131938 Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma enhanced CVD using template porous alumina substrate. The growing heterogeneous Si layer is composed of nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman spectroscopy and XRD data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches forming the honeycomb net and presumably amorphous Si:H areas between them. (C) 2009 Elsevier B.V. All rights reserved. English Elsevier BV Nanomorph silicon grown on template alumina substrate by plasma-enhanced CVD Article 10.1016/j.matlet.2009.09.002 1 Materials Letters, v.63, no.29, pp.2552 - 2555 Materials Letters 63 29 2552 2555 N scopus 000271127700007 2-s2.0-70349495346 Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Article RAMAN-SPECTROSCOPY MICROCRYSTALLINE SILICON CRYSTALLITE SIZE NANOWIRES PHASE FILMS MECHANISM Silicon Nanocrystals Amorphous materials Plasma processing Chemical vapour deposition Template