Kim, Minho Ha, Woo-Jin Anh, Jin-Woo Kim, Hye-Sung Park, Sang-Whan Lee, Dongyun 2024-01-20T20:34:38Z 2024-01-20T20:34:38Z 2021-09-05 2009-09-18 0925-8388 https://pubs.kist.re.kr/handle/201004/132156 Nanoporous gold thin films were fabricated on Si substrates by dealloying Au-Ag alloy films, created by elevated temperature annealing of deposited Au and Ag multilayers. The effects of various chemical compositions, heat treatment, and dealloying methods and conditions (dissolution rate) were examined. Nanoporous gold films showing significantly less cracking in tens of millimeters and reduced ligament size under 10 nm were fabricated from properly alloyed Au-Ag films using a well-controlled electrochemical dealloying process with diluted aqueous HClO4 as an electrolyte. (C) 2009 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA SURFACES METALS Fabrication of nanoporous gold thin films on silicon substrate by multilayer deposition of Au and Ag Article 10.1016/j.jallcom.2009.05.067 1 JOURNAL OF ALLOYS AND COMPOUNDS, v.484, no.1-2, pp.28 - 32 JOURNAL OF ALLOYS AND COMPOUNDS 484 1-2 28 32 scie scopus 000271334900008 2-s2.0-69949085784 Chemistry, Physical Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering Chemistry Materials Science Metallurgy & Metallurgical Engineering Article SURFACES METALS Thin films Physical vapor deposition Heat-treatment Electrolytic dealloying Nanoporous gold