Choo, Sung Joong Lee, Byung-Chul Lee, Sang-Myung Park, Jung Ho Shin, Hyun-Joon 2024-01-20T21:00:45Z 2024-01-20T21:00:45Z 2021-09-04 2009-09 0960-1317 https://pubs.kist.re.kr/handle/201004/132211 In this paper, silicon oxynitride layers deposited with different plasma-enhanced chemical vapor deposition (PECVD) conditions were fabricated and optimized, in order to make an interferometric sensor for detecting biochemical reactions. For the optimization of PECVD silicon oxynitride layers, the influence of the N(2)O/SiH(4) gas flow ratio was investigated. RF power in the PEVCD process was also adjusted under the optimized N(2)O/SiH(4) gas flow ratio. The optimized silicon oxynitride layer was deposited with 15 W in chamber under 25/150 sccm of N(2)O/SiH(4) gas flow rates. The clad layer was deposited with 20 W in chamber under 400/150 sccm of N(2)O/SiH(4) gas flow condition. An integrated Mach-Zehnder interferometric biosensor based on optical waveguide technology was fabricated under the optimized PECVD conditions. The adsorption reaction between bovine serum albumin (BSA) and the silicon oxynitride surface was performed and verified with this device. English Institute of Physics Publishing Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor Article 10.1088/0960-1317/19/9/095007 1 Journal of Micromechanics and Microengineering, v.19, no.9 Journal of Micromechanics and Microengineering 19 9 N scopus 000269474500027 2-s2.0-70350680938 Engineering, Electrical & Electronic Nanoscience & Nanotechnology Instruments & Instrumentation Physics, Applied Engineering Science & Technology - Other Topics Instruments & Instrumentation Physics Editorial Material OPTICAL SENSORS WAVE-GUIDES FABRICATION TECHNOLOGY Biosensor MEMS Planar waveguide PECVD interferometric sensor