Kim, Youngsoo Lee, Ji-Hye Kim, Kang-Jin Lee, Yeonhee 2024-01-20T21:05:08Z 2024-01-20T21:05:08Z 2021-09-01 2009-07 0734-2101 https://pubs.kist.re.kr/handle/201004/132380 Different fluorocarbon thin films were deposited on Si substrates using a plasma-polymerization method. Fluorine-containing hydrophobic thin films were obtained by inductively coupled plasma (ICP) and pulsed plasma (PP) with a mixture of fluorocarbon precursors C2F6, C3F8, and c-C4F8 and the unsaturated hydrocarbons of C2H2. The influence on the fluorocarbon surfaces of the process parameters for plasma polymerization, including the gas ratio and the plasma power, were investigated under two plasma-polymerized techniques with different fluorocarbon gas precursors. The hydrophobic properties, surface morphologies, and chemical compositions were elucidated using water contact angle measurements, field emission-scanning electron microscope, x-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FT-IR), and time-of-flight secondary ion mass spectrometry (TOF-SIMS). In this study, the ICP technique provides coarser grained films and more hydrophobic surfaces as well as a higher deposition rate compared to the PP technique. XPS, FT-IR, and TOF-SIMS analyses indicated that the ICP technique produced more fluorine-related functional groups, including CF2 and CF3, on the surface. From the curve-fitted XPS results, fluorocarbon films grown under ICP technique exhibited less degree of cross-linking and higher CF2 concentrations than those grown under PP technique. English A V S AMER INST PHYSICS FLUOROCARBON FILMS GLOW-DISCHARGE POLYMERIZATION POWER POLYMERS Surface characterization of hydrophobic thin films deposited by inductively coupled and pulsed plasmas Article 10.1116/1.3136763 1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.27, no.4, pp.900 - 906 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 27 4 900 906 scie scopus 000267600000053 2-s2.0-67650290306 Materials Science, Coatings & Films Physics, Applied Materials Science Physics Article; Proceedings Paper FLUOROCARBON FILMS GLOW-DISCHARGE POLYMERIZATION POWER POLYMERS contact angle elemental semiconductors field emission Fourier transform spectra infrared spectra organic compounds plasma deposition polymerisation scanning electron microscopy secondary ion mass spectra silicon surface morphology thin films time of flight spectra X-ray photoelectron spectra