Ahn, Kwang-Duk Yoo, Kyoung Wook Soh, Jin-Ho Kang, Jong-Hee 2024-01-20T22:02:11Z 2024-01-20T22:02:11Z 2021-09-03 2009-02 1381-5148 https://pubs.kist.re.kr/handle/201004/132775 Styrene monomers, possessing three kinds of protected quinizarin (Qz) dye precursors such as tBOC, acetyl and tosyl groups, have been prepared and copolymerized with MMA in high yields to obtain protected-Qz precursor polymers (pr-QzP). Thermal and photoinduced acidolytic deprotection behaviors were investigated to confirm the regeneration of the Qz moieties in the polymer films by thermal and spectral analyses. Lithographic fluorescent photoimaging on spin-cast films of pr-QzP containing a photo-acid generator resulted in high resolution and sensitivity by a dry process based on chemical amplification. In the dry lithography process, finely resolved sub-0.4-micrometer fluorescent patterns were delineated on the thin precursor polymer films without using a developer. (C) 2008 Elsevier Ltd. All rights reserved. English ELSEVIER SCIENCE BV PHOTOCHEMICAL ACID GENERATION T-BOC ORGANIC NANOPARTICLES COLOR COPOLYMER FILMS LITHOGRAPHY MOLECULES EMISSION Fluorescent photoimaging with polymers having protected quinizarin dye precursors by a dry process based on chemical amplification Article 10.1016/j.reactfunctpolym.2008.10.012 1 REACTIVE & FUNCTIONAL POLYMERS, v.69, no.2, pp.111 - 116 REACTIVE & FUNCTIONAL POLYMERS 69 2 111 116 scie scopus 000264281000006 2-s2.0-59649096948 Chemistry, Applied Engineering, Chemical Polymer Science Chemistry Engineering Polymer Science Article PHOTOCHEMICAL ACID GENERATION T-BOC ORGANIC NANOPARTICLES COLOR COPOLYMER FILMS LITHOGRAPHY MOLECULES EMISSION Deprotection by acidolysis Fluorescent imaging Lithography Photogenerated acid Quinizarin polymers