<?xml version="1.0" encoding="utf-8" standalone="no"?>
<dublin_core schema="dc">
<dcvalue element="contributor" qualifier="author">Joo,&#x20;S.-H.</dcvalue>
<dcvalue element="contributor" qualifier="author">Lee,&#x20;S.-R.</dcvalue>
<dcvalue element="contributor" qualifier="author">Cho,&#x20;W.I.</dcvalue>
<dcvalue element="contributor" qualifier="author">Cho,&#x20;B.W.</dcvalue>
<dcvalue element="date" qualifier="accessioned">2024-01-20T22:02:29Z</dcvalue>
<dcvalue element="date" qualifier="available">2024-01-20T22:02:29Z</dcvalue>
<dcvalue element="date" qualifier="created">2021-09-02</dcvalue>
<dcvalue element="date" qualifier="issued">2009-02</dcvalue>
<dcvalue element="identifier" qualifier="issn">1225-0562</dcvalue>
<dcvalue element="identifier" qualifier="uri">https:&#x2F;&#x2F;pubs.kist.re.kr&#x2F;handle&#x2F;201004&#x2F;132787</dcvalue>
<dcvalue element="description" qualifier="abstract">This&#x20;study&#x20;investigated&#x20;the&#x20;dependence&#x20;of&#x20;the&#x20;various&#x20;sputtering&#x20;conditions&#x20;(Ar&#x20;pressure:&#x20;2-10&#x20;mTorr,&#x20;Power:&#x20;50-150&#x20;W)&#x20;and&#x20;thickness&#x20;(50-1200&#x20;nm)&#x20;of&#x20;Si&#x20;thin&#x20;film&#x20;on&#x20;the&#x20;electrochemical&#x20;properties,&#x20;microstructural&#x20;properties&#x20;and&#x20;the&#x20;capacity&#x20;fading&#x20;of&#x20;a&#x20;Si&#x20;thin&#x20;film&#x20;anode.&#x20;A&#x20;Si&#x20;layer&#x20;and&#x20;a&#x20;Ti&#x20;buffer&#x20;layer&#x20;were&#x20;deposited&#x20;on&#x20;Copper&#x20;foil&#x20;by&#x20;RF-magnetron&#x20;sputtering.&#x20;At&#x20;10&#x20;mTorr,&#x20;the&#x20;50&#x20;W&#x20;sample&#x20;showed&#x20;the&#x20;best&#x20;capacity&#x20;of&#x20;3323&#x20;mAh&#x2F;g,&#x20;while&#x20;the&#x20;100&#x20;W&#x20;sample&#x20;showed&#x20;the&#x20;best&#x20;capacity&#x20;retention&#x20;of&#x20;91.7%,&#x20;also&#x20;at&#x20;10&#x20;mTorr.&#x20;The&#x20;initial&#x20;capacities&#x20;and&#x20;capacity&#x20;retention&#x20;in&#x20;the&#x20;samples&#x20;apart&#x20;from&#x20;the&#x20;50&#x20;W&#x20;sample&#x20;at&#x20;10&#x20;mTorr&#x20;were&#x20;enhanced&#x20;as&#x20;the&#x20;Ar&#x20;pressure&#x20;and&#x20;power&#x20;increased.&#x20;This&#x20;was&#x20;considered&#x20;to&#x20;be&#x20;related&#x20;to&#x20;the&#x20;change&#x20;of&#x20;the&#x20;microstructure&#x20;and&#x20;the&#x20;surface&#x20;morphology&#x20;by&#x20;various&#x20;sputtering&#x20;conditions.&#x20;In&#x20;addition,&#x20;thinner&#x20;Si&#x20;film&#x20;anodes&#x20;showed&#x20;better&#x20;cycling&#x20;performance.&#x20;This&#x20;phenomenon&#x20;is&#x20;caused&#x20;by&#x20;the&#x20;structural&#x20;stress&#x20;and&#x20;peeling&#x20;off&#x20;of&#x20;the&#x20;Si&#x20;layer&#x20;by&#x20;the&#x20;high&#x20;volume&#x20;change&#x20;of&#x20;Si&#x20;during&#x20;the&#x20;charge&#x2F;discharge&#x20;process.</dcvalue>
<dcvalue element="language" qualifier="none">Korean</dcvalue>
<dcvalue element="subject" qualifier="none">a-Si&#x20;layers</dcvalue>
<dcvalue element="subject" qualifier="none">Capacity&#x20;fading</dcvalue>
<dcvalue element="subject" qualifier="none">Capacity&#x20;retention</dcvalue>
<dcvalue element="subject" qualifier="none">Charge&#x2F;discharge</dcvalue>
<dcvalue element="subject" qualifier="none">Copper&#x20;foils</dcvalue>
<dcvalue element="subject" qualifier="none">Cycling&#x20;performance</dcvalue>
<dcvalue element="subject" qualifier="none">Deposition&#x20;condition</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium&#x20;ion&#x20;battery</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium&#x20;secondary&#x20;batteries</dcvalue>
<dcvalue element="subject" qualifier="none">Microstructural&#x20;properties</dcvalue>
<dcvalue element="subject" qualifier="none">rf-Magnetron&#x20;sputtering</dcvalue>
<dcvalue element="subject" qualifier="none">Si&#x20;film&#x20;anode</dcvalue>
<dcvalue element="subject" qualifier="none">Si&#x20;layer</dcvalue>
<dcvalue element="subject" qualifier="none">Silicon&#x20;anode</dcvalue>
<dcvalue element="subject" qualifier="none">Sputtering&#x20;conditions</dcvalue>
<dcvalue element="subject" qualifier="none">Structural&#x20;stress</dcvalue>
<dcvalue element="subject" qualifier="none">Thin&#x20;film&#x20;anodes</dcvalue>
<dcvalue element="subject" qualifier="none">Volume&#x20;change</dcvalue>
<dcvalue element="subject" qualifier="none">Electrochemical&#x20;properties</dcvalue>
<dcvalue element="subject" qualifier="none">Film&#x20;thickness</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium&#x20;alloys</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium&#x20;batteries</dcvalue>
<dcvalue element="subject" qualifier="none">Lithium&#x20;compounds</dcvalue>
<dcvalue element="subject" qualifier="none">Silicon</dcvalue>
<dcvalue element="subject" qualifier="none">Thin&#x20;film&#x20;devices</dcvalue>
<dcvalue element="subject" qualifier="none">Thin&#x20;films</dcvalue>
<dcvalue element="subject" qualifier="none">Semiconducting&#x20;silicon&#x20;compounds</dcvalue>
<dcvalue element="title" qualifier="none">Influence&#x20;of&#x20;sputtering&#x20;conditions&#x20;on&#x20;structural&#x20;and&#x20;electrochemical&#x20;properties&#x20;of&#x20;the&#x20;Si&#x20;anode&#x20;film&#x20;for&#x20;lithium&#x20;secondary&#x20;batteries</dcvalue>
<dcvalue element="type" qualifier="none">Article</dcvalue>
<dcvalue element="identifier" qualifier="doi">10.3740&#x2F;MRSK.2009.19.2.073</dcvalue>
<dcvalue element="description" qualifier="journalClass">1</dcvalue>
<dcvalue element="identifier" qualifier="bibliographicCitation">Korean&#x20;Journal&#x20;of&#x20;Materials&#x20;Research,&#x20;v.19,&#x20;no.2,&#x20;pp.73&#x20;-&#x20;78</dcvalue>
<dcvalue element="citation" qualifier="title">Korean&#x20;Journal&#x20;of&#x20;Materials&#x20;Research</dcvalue>
<dcvalue element="citation" qualifier="volume">19</dcvalue>
<dcvalue element="citation" qualifier="number">2</dcvalue>
<dcvalue element="citation" qualifier="startPage">73</dcvalue>
<dcvalue element="citation" qualifier="endPage">78</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scopus</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">kci</dcvalue>
<dcvalue element="identifier" qualifier="kciid">ART001321147</dcvalue>
<dcvalue element="identifier" qualifier="scopusid">2-s2.0-68649114141</dcvalue>
<dcvalue element="type" qualifier="docType">Article</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">a-Si&#x20;layers</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Capacity&#x20;fading</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Capacity&#x20;retention</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Charge&#x2F;discharge</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Copper&#x20;foils</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Cycling&#x20;performance</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Deposition&#x20;condition</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium&#x20;ion&#x20;battery</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium&#x20;secondary&#x20;batteries</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Microstructural&#x20;properties</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">rf-Magnetron&#x20;sputtering</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Si&#x20;film&#x20;anode</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Si&#x20;layer</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Silicon&#x20;anode</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Sputtering&#x20;conditions</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Structural&#x20;stress</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Thin&#x20;film&#x20;anodes</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Volume&#x20;change</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Electrochemical&#x20;properties</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Film&#x20;thickness</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium&#x20;alloys</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium&#x20;batteries</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Lithium&#x20;compounds</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Silicon</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Thin&#x20;film&#x20;devices</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Thin&#x20;films</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">Semiconducting&#x20;silicon&#x20;compounds</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">Deposition&#x20;condition</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">Lithium&#x20;ion&#x20;battery</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">Silicon&#x20;anode</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">Sputtering</dcvalue>
</dublin_core>
