Kumar, P. Kumar, Ravi Kanjilal, D. Knobel, M. Thakur, P. Chae, K. H. 2024-01-20T23:03:11Z 2024-01-20T23:03:11Z 2021-09-03 2008-07 1071-1023 https://pubs.kist.re.kr/handle/201004/133366 Fabrication and fluence dependent growth of Ni nanoparticles in quartz matrix using a low energy ion implantation followed by thermal annealing are reported. 100 keV Ni ions are implanted (at room temperature) in quartz at different ion fluences using a low energy ion beam facility. The samples are postannealed at 600 degrees C and then characterized using atomic force microscopy, magnetic force microscopy, field cooled and zero field cooled magnetization measurements, x-ray absorption spectroscopy, and UV-visible spectroscopy. Nanoclusters of Ni of nearly uniform size are synthesized at an ion fluence of 5x10(16) ions/cm(2). The size of these nanoclusters could be varied by varying ion fluence. Formation of NiO nanoclusters is observed for ion fluence of 2x10(17) ions/cm(2). (c) 2008 American Vacuum Society. English A V S AMER INST PHYSICS SILICA GLASS NANOCLUSTERS IMPLANTATION PARTICLES Ion beam synthesis of Ni nanoparticles embedded in quartz Article 10.1116/1.2956624 1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.26, no.4, pp.L36 - L40 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 26 4 L36 L40 scie scopus 000258494400002 2-s2.0-49749097959 Engineering, Electrical & Electronic Nanoscience & Nanotechnology Physics, Applied Engineering Science & Technology - Other Topics Physics Letter SILICA GLASS NANOCLUSTERS IMPLANTATION PARTICLES nanoparticle ion implantation x-ray absorption spectroscopy