Kim, Bong Hoon Shin, Dong Ok Jeong, Seong-Jun Koo, Chong Min Jeon, Sang Chul Hwang, Wook Jung Lee, Sumi Lee, Moon Gyu Kim, Sang Ouk 2024-01-20T23:03:41Z 2024-01-20T23:03:41Z 2021-09-03 2008-06-18 0935-9648 https://pubs.kist.re.kr/handle/201004/133390 Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning. English WILEY-V C H VERLAG GMBH SINGLE-LAYER FILMS THIN-FILMS PATTERNS ARRAYS SOLIDIFICATION NANOSTRUCTURE ORIENTATION CYLINDERS SURFACES Hierarchical self-assembly of block copolymers for lithography-free nanopatterning Article 10.1002/adma.200702285 1 ADVANCED MATERIALS, v.20, no.12, pp.2303 - + ADVANCED MATERIALS 20 12 2303 + scie scopus 000257268500010 2-s2.0-54949119540 Chemistry, Multidisciplinary Chemistry, Physical Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter Chemistry Science & Technology - Other Topics Materials Science Physics Article SINGLE-LAYER FILMS THIN-FILMS PATTERNS ARRAYS SOLIDIFICATION NANOSTRUCTURE ORIENTATION CYLINDERS SURFACES block copolymer self assembly soft patterning