Lee, S. G. Shin, S. W. Lee, J. Lee, J.-H. Song, J. H. Choi, J.-Y. Lee, H. H. Lee, H. S. 2024-01-21T01:00:28Z 2024-01-21T01:00:28Z 2021-09-02 2007-07 0374-4884 https://pubs.kist.re.kr/handle/201004/134297 An epitaxial Ni(4.5 mn - 100 nm)/Cu nanostructure has been fabricated on a Si(001) substrate by using nanoporous anodic aluminum oxide (AAO) as a mask during evaporation. Both the nanosized Cu and Ni layers have (001) surfaces with a Ni < 110 > // Cu < 110 > // Si < 001 > in-plane relation. The Ni nanostructure is found to be less strained than the film at the same Ni thickness, which plays a crucial role in determining the magnetic anisotropy of the nanostructure. Combining a self-assembled AAO mask with a conventional evaporation method can be a potential technique, instead of traditional lithography, for the growth of various epitaxial metal nanostructures. English KOREAN PHYSICAL SOC ANODIC ALUMINA MAGNETIC NANOSTRUCTURES SELF-ORGANIZATION ANISOTROPY FILMS CU(001) ARRAYS NI Fabrication and structural analysis of an epitaixal Ni/Cu(001) nanostructure on a Si substrate Article 10.3938/jkps.51.178 1 JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.51, no.1, pp.178 - 182 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 51 1 178 182 scie scopus kci 000248062900031 2-s2.0-34547693002 Physics, Multidisciplinary Physics Article ANODIC ALUMINA MAGNETIC NANOSTRUCTURES SELF-ORGANIZATION ANISOTROPY FILMS CU(001) ARRAYS NI epitaxial Ni/Cu nnanostructure AAO strain magnetic anisotropy