Bae, H. S. Im, Seongil Song, J. H. 2024-01-21T03:03:50Z 2024-01-21T03:03:50Z 2021-09-01 2006-06 0013-4651 https://pubs.kist.re.kr/handle/201004/135495 We report on the fabrication of ultraviolet (UV)-detecting ZnO-based thin-film transistors (TFTs) and their isolation by energetic B ions. After deposition on a SiO2/p(+)-Si substrate at 300 degrees C by radio frequency (rf) sputtering, the ZnO layer was patterned with Al source/drain (S/D) contacts and a SiOx window. Then energetic B ions with 30 and 55 keV were implanted onto the deposited structures for device isolation. Among the three samples of unimplanted, 30 keV-, and 55 keV-implanted devices, the 55 keV-implanted one displayed the least gate current leakage (similar to 100 pA). The ZnO-TFT isolated with 55 keV B also showed a field mobility of 0.7 cm(2)/V s and on/off current ratio of more than similar to 10(4), respectively. Under 364 nm UV light of 0.2 mW/cm(2) and at zero volts of gate bias, the device exhibited a photo-to-dark current ratio of similar to 5 x 10(3) with a temporal response of about 10 ms. English ELECTROCHEMICAL SOC INC THIN-FILM TRANSISTORS IMPLANTATION Device isolation of ultraviolet-detecting ZnO-based transistors using energetic B ions Article 10.1149/1.2212068 1 JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.9, pp.G791 - G794 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 153 9 G791 G794 scie scopus 000239250600058 2-s2.0-33746471712 Electrochemistry Materials Science, Coatings & Films Electrochemistry Materials Science Article THIN-FILM TRANSISTORS IMPLANTATION