Pathan, HM Min, SK Desai, JD Jung, KD Joo, OS 2024-01-21T03:04:15Z 2024-01-21T03:04:15Z 2021-09-01 2006-05-10 0254-0584 https://pubs.kist.re.kr/handle/201004/135511 Successive ionic layer adsorption and reaction (SILAR) is a process for depositing uniform, crystalline and conformal thin films by alternating exposures to cations and anions. SILAR has been successfully demonstrated for many metal oxides, but not for titanium dioxide (TiO2). Here we demonstrate process for deposition of TiO2 thin films using SILAR method. Titanium tri-chloride and ammonium hydroxide were used as cationic and anionic sources, respectively. Their surface reactions were found to be complementary and self-limiting, thus providing compact, uniform films with control over thickness of the film. The preparative conditions were optimized to get good-quality TiO2 thin films. The films have been characterized for structural, morphological, compositional, optical and photo-response properties. Growth process, reaction mechanism and annealing effect are also discussed. (c) 2005 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA DEPOSITION OXIDE ELECTRODEPOSITION PHOTOCATALYST ANATASE Preparation and characterization of titanium dioxide thin films by SILAR method Article 10.1016/j.matchemphys.2005.04.009 1 MATERIALS CHEMISTRY AND PHYSICS, v.97, no.1, pp.5 - 9 MATERIALS CHEMISTRY AND PHYSICS 97 1 5 9 scie scopus 000236458400002 2-s2.0-33644695530 Materials Science, Multidisciplinary Materials Science Article DEPOSITION OXIDE ELECTRODEPOSITION PHOTOCATALYST ANATASE SILAR TiO2 synthesis and properties