Yu, JS Song, JD Lee, YT Lim, H 2024-01-21T04:36:53Z 2024-01-21T04:36:53Z 2021-09-03 2005-08 0268-1242 https://pubs.kist.re.kr/handle/201004/136260 The effects of impurity-free vacancy diffusion using a SiO2 capping layer on the optical and optoelectronic properties of the In0.53Ga0.47As/In0.52Al0.48As multiple quantum wells (MQW) electroabsorption (EA) modulator structure are investigated. A significant improvement (about 20 times compared to an as-grown sample) of photoluminescence (PL) intensity was observed after thermal treatments at temperatures of above 700 degrees C. In this structure, however, a red shift was observed after rapid thermal annealing (RTA) using the SiO2 capping layer, in contrast to the blue shift in conventional interdiffused MQW. A red shift of about 27 meV was obtained at an annealing temperature of 800 degrees C for 45 s without noticeable PL linewidth broadening. We believe that the red shift is attributed to the exchange between Ga of an InGaAs well and In of an InAlAs barrier. InGaAs/InAlAs MQW EA modulators were fabricated on as-grown and annealed substrates. The basic characteristics of the devices fabricated before and after RTA were evaluated by current-voltage and photocurrent measurements. English IOP PUBLISHING LTD PHOTONIC INTEGRATED-CIRCUITS ION-IMPLANTATION INTERFACE Influence of impurity-free vacancy diffusion on the optical and optoelectronic properties of the In0.53Ga0.47As/In0.52Al0.48As multiple quantum wells electroabsorption modulator structure Article 10.1088/0268-1242/20/8/039 1 SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.20, no.8, pp.851 - 855 SEMICONDUCTOR SCIENCE AND TECHNOLOGY 20 8 851 855 scie scopus 000231674100043 2-s2.0-22844452436 Engineering, Electrical & Electronic Materials Science, Multidisciplinary Physics, Condensed Matter Engineering Materials Science Physics Article PHOTONIC INTEGRATED-CIRCUITS ION-IMPLANTATION INTERFACE In0.53Ga0.47As In0.52Al0.48As multiple quantum wells impurity-free vacancy diffusion