Lee, SG Kim, SP Lee, KR Chung, YC 2024-01-21T05:34:05Z 2024-01-21T05:34:05Z 2021-09-03 2005-02-01 0304-8853 https://pubs.kist.re.kr/handle/201004/136747 In the present work, we investigated deposition behavior of atomic-level interface and surface structure when Ni atoms were deposited on A1(0 0 1) substrate according to substrate temperature and adatom incident energy. In spite of low adatom incident energy of 0.1 eV at room temperature, Ni-Al intermixing occurred actively at the interface and NiAl (B2) and Ni3Al(L1(2)) were found in the interface region. It is found that the interface structure was strongly dependent on the substrate temperature and the adatom incident energy. (C) 2004 Elsevier B.V. All rights reserved. English ELSEVIER GROWTH AU CO Atomic-level investigation of interface structure in Ni-Al multilayer system: molecular dynamics simulation Article 10.1016/j.jmmm.2004.09.098 1 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.286, pp.394 - 398 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 286 394 398 scie scopus 000226638400085 2-s2.0-11444252406 Materials Science, Multidisciplinary Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper GROWTH AU CO Ni-Al metallic multilayer molecular dynamics simulation embedded atom method (EAM) interface structure