Lee, J Nam, SC Tak, Y 2024-01-21T05:40:52Z 2024-01-21T05:40:52Z 2021-09-05 2005-01 0256-1115 https://pubs.kist.re.kr/handle/201004/136872 Zinc oxide (ZnO) was potentiostatically deposited on indium tin oxide (ITO) substrates. Comparing of the theoretical mass/charge ratio with experimental value measured by in-situ electrochemical quartz crystal microbalance, the origin of deposition mechanism of ZnO could be explained as follows: (i) surface pH enhancement due to the adsorption of hydroxide ion; (ii) the formation of intermediate species (i.e., zinc hydroxide (Zn(OH)(+)); (iii) ZnO deposition with production of water. Ex-situ morphological and structural analyses by scanning electron microscope and X-ray diffraction strongly supported the deposition mechanism of ZnO. This also showed that hexagonal shaped ZnO islands were first formed on ITO cathode and grew into compact ZnO films, and the formation behaviour of ZnO was clearly explained via analysis of the profile of measured current. English KOREAN INSTITUTE CHEMICAL ENGINEERS ELECTROCHEMICAL DEPOSITION ZINC-OXIDE FILMS On the origin of electrodeposition mechanism of ZnO on ITO substrate Article 10.1007/BF02701479 1 KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.22, no.1, pp.161 - 164 KOREAN JOURNAL OF CHEMICAL ENGINEERING 22 1 161 164 scie scopus kci 000227057800026 2-s2.0-17444417433 Chemistry, Multidisciplinary Engineering, Chemical Chemistry Engineering Article ELECTROCHEMICAL DEPOSITION ZINC-OXIDE FILMS ZnO electrodeposition mechanistic origin in-situ mass change growth mode conducting characteristics