Kim, YH Kim, SI 2024-01-21T06:02:17Z 2024-01-21T06:02:17Z 2021-09-05 2004-12 0374-4884 https://pubs.kist.re.kr/handle/201004/136982 YBCO thin films were fabricated by off-axis rf magnetron sputtering at various oxygen partial pressures to obtain a smooth surface morphology applicable to the fabrication of various heterostructures, such as a perovskite-type ferroelectric film on YBCO, a Pr(1-x)ca(x)MnO(3) film on YBCO for a high-density nonvolatile memory, and so on. The surface morphologies of the YBCO thin films were enhanced gradually with increasing oxygen partial pressure; finally, a smooth surface was obtained at the highest oxygen partial pressure attempted in this study, at which the flow rates of 02 and Ar were 5 and 1 sccm, respectively (02 : Ar = 5 : 1). Both the stoichiometric composition and the growth rate compatible with the substrate temperature were found to be favorable for getting a smooth surface morphology for YBCO thin films. English KOREAN PHYSICAL SOC HETEROSTRUCTURES POLARIZATION DEPOSITION Effect of oxygen partial pressure on the surface morphology of sputtered YBCO thin films Article 1 JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.6, pp.1584 - 1587 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 45 6 1584 1587 scie scopus kci 000225777600028 2-s2.0-17544373448 Physics, Multidisciplinary Physics Article HETEROSTRUCTURES POLARIZATION DEPOSITION YBCO thin films RF magnetron sputtering smooth surface morphology