제해준 김병국 2024-01-21T06:08:10Z 2024-01-21T06:08:10Z 2021-09-06 2004-11 1225-0562 https://pubs.kist.re.kr/handle/201004/137091 The degradation mechanism of soft magnetic properties of Fe-Hf-N/Cr/SiO2 thin films reacted with a bonding glass was investigated. When Fe-Hf-N/Cr/SiO2 films were annealed under 600℃ without the bonding glass, the compositions and the soft magnetic properties of Fe-Hf-N layers were not changed. However, after reaction with the bonding glass at 550℃, the soft magnetic properties of the film were degraded. At 600℃, the saturation magnetization of the reacted film decreased to 13.5 kG, and its coercivity increased to 4 Oe, and its effective permeability decreased to 700. It was founded that O diffused from the glass into the Fe-Hf-N layers during the reaction and generated HfO2 phases. It was considered that the soft magnetic properties of the Fe-Hf-N/Cr/SiO2 films reacted with the bonding glass were primarily degraded by the formation of the Fe-Hf-O-N layer of which the Fe content was below 60 at%, and secondarily degraded by the Fe-Hf-O-N layer above 70 at%. 한국재료학회 접합유리와 반응된 Fe-Hf-N/Cr/SiO2 박막의 연자기 특성 열화 Degradation of Soft Magnetic Properties of Fe-Hf-N/Cr/SiO2 Thin Films Reacted with Bonding Glass Article 2 한국재료학회지, v.14, no.11, pp.780 - 785 한국재료학회지 14 11 780 785 kci ART000929543 Fe-Hf-N/Cr/SiO2 film bonding glass reaction magnetic degradation. Fe-Hf-N/Cr/SiO2 film bonding glass reaction magnetic degradation.