Kim, YW Jung, YD Han, S Lee, Y Kim, GH 2024-01-21T06:36:03Z 2024-01-21T06:36:03Z 2021-09-04 2004-08-02 0257-8972 https://pubs.kist.re.kr/handle/201004/137320 Spatial and temporal evolution of the plasma parameters in a pulsed inductively coupled discharge for plasma source ion implantation (PSII) process was studied experimentally. Langmuir probe current and voltage measurements were performed to determine the plasma parameters. To measure the time-resolved plasma parameters automatically, data acquisition (DAQ) system was designed using a LabVIEW(R) program and interfaced to a computer with data acquisition card. Time-resolved plasma parameters consisted of two regions: RF pulse ON time and OFF time. Experiments revealed that the plasma parameters reached a steady state at about 500 mus after the RF pulse ON and they shrunk gradually after the end of the RE pulse. It was also observed that the radial and axial profiles of plasma density were uniform in large area plasma chamber at peak RF power below 20 kW. (C) 2004 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA LANGMUIR PROBE REDUCTION Time-resolved plasma measurement in a high-power pulsed ICP source for large area Article 10.1016/j.surfcoat.2004.04.052 1 SURFACE & COATINGS TECHNOLOGY, v.186, no.1-2, pp.161 - 164 SURFACE & COATINGS TECHNOLOGY 186 1-2 161 164 scie scopus 000222844200031 2-s2.0-17644426026 Materials Science, Coatings & Films Physics, Applied Materials Science Physics Article; Proceedings Paper LANGMUIR PROBE REDUCTION pulsed plasma time-resolved Langmuir probe LabVIEW