Lim, G Lee, JH Kim, J Lee, HW Hyun, SH 2024-01-21T07:09:01Z 2024-01-21T07:09:01Z 2021-09-02 2004-05 0255-5476 https://pubs.kist.re.kr/handle/201004/137646 Nano-crystalline CeO2 was synthesized by the mechanical milling and subsequent heat-treatment from the mixture of Ce(OH)(4) as precursor, and NaCl as diluent. The diluent provided diffusion barrier during milling and heat-treatment, which was easily dissolved out by deionized water. The size of crystallite and the strain variance of CeO2 were depended on the temperature and heat-treatment time: increased with the temperature (400similar to700degreesC) and time (1similar to24 hours) increasing, and saturated near at 20nm in size owing to the densification of diluent. The synthesized nano-crystalline CeO2 powder was applied as an abrasive in CMP (Chemical Mechanical Planarization) slurry. When blanket-type SiO2 and Si3N4 wafers were polished with the slurries, the removal rates (RR) Of SiO2 and Si3N4 wafers and selectivities (R-R-SiO2/RRSi3N4) were influenced by synthetic condition of abrasive, the suspension stability and the pHs of slurries. English TRANS TECH PUBLICATIONS LTD POWDER Mechanochemical synthesis of nano-sized CeO2 and its application for CMP slurry Article 10.4028/www.scientific.net/MSF.449-452.1105 1 DESIGNING, PROCESSING AND PROPERTIES OF ADVANCED ENGINEERING MATERIALS, PTS 1 AND 2, v.449-4, pp.1105 - 1108 DESIGNING, PROCESSING AND PROPERTIES OF ADVANCED ENGINEERING MATERIALS, PTS 1 AND 2 449-4 1105 1108 scie scopus 000189492000273 2-s2.0-18544404145 Materials Science, Ceramics Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering Materials Science Metallurgy & Metallurgical Engineering Article; Proceedings Paper POWDER nanocrystalline CeO2 mechanochemical processing CMP slurry stability