Ko, HY Lee, HW Moon, J 2024-01-21T07:39:08Z 2024-01-21T07:39:08Z 2021-09-02 2004-01-30 0040-6090 https://pubs.kist.re.kr/handle/201004/137922 Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stober process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5 X 1.5 mm(2)). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness similar to60nm on the Si substrate after the removal of the colloidal silica. (C) 2003 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA CRYSTALLIZATION MULTILAYERS PARTICLES SPHERES FILMS Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask Article 10.1016/j.tsf.2003.04.001 1 THIN SOLID FILMS, v.447, pp.638 - 644 THIN SOLID FILMS 447 638 644 scie scopus 000188995700110 2-s2.0-1342323664 Materials Science, Multidisciplinary Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper CRYSTALLIZATION MULTILAYERS PARTICLES SPHERES FILMS monodisperse colloidal silica self-assembled monolayer patterned Pt structure