Jae-Seob Hwang 김우식 박형호 김태송 2024-01-21T08:32:48Z 2024-01-21T08:32:48Z 2022-01-10 2003-08 1229-7801 https://pubs.kist.re.kr/handle/201004/138353 English 한국세라믹학회 Sol-gel Mechanism of Self-patternable PZT Film Starting from Alkoxides' Precursors Article 2 한국세라믹학회지, v.40, no.4, pp.13 - 13 한국세라믹학회지 40 4 13 13 kci ART001009448 sol-gel self-patterning PZT photosensitizer UV exposure1. IntroductionSol-gel process contains fractal geometry and percolation theory in physics hydrolysis and poly-condensation mechanism in chemistry sintering and structural relaxation in ce sol-gel self-patterning PZT photosensitizer UV exposure1. IntroductionSol-gel process contains fractal geometry and percolation theory in physics hydrolysis and poly-condensation mechanism in chemistry sintering and structural relaxation in ce