Jeung, WY Choi, DH Lee, KH 2024-01-21T09:35:17Z 2024-01-21T09:35:17Z 2021-09-01 2003-01 0137-1339 https://pubs.kist.re.kr/handle/201004/138937 We have investigated effects of an external magnetic field on perpendicular magnetic anisotropy (PMA) of electrodeposited continuous films and micro-patterned arrays. For continuous films, external magnetic field gave rise to a highly aligned grain structure with PMA. Our results indicate that the effect of applied magnetic field is apparent only at specific current density. XRD patterns showed that electrodeposited continuous Co films consist of hexagonal cobalt only and have strong texture for grains with the c-axis lying perpendicular to the film plane. The patterned arrays were fabricated by UV-LIGA process, and PMA was modified by changing the aspect ratio of patterned arrays. Our results suggest that there is a critical aspect ratio at which PMA dominates in-plane anisotropy. For the patterned arrays, however, the external magnetic field was not very effective due to a large concentration polarization. English OFICYNA WYDAWNICZA POLITECHNIKI WROCLAWSKIEJ MEDIA Effects of an external magnetic field on the perpendicular magnetic anisotropy of electrodeposited micro-patterned arrays Article 1 MATERIALS SCIENCE-POLAND, v.21, no.1, pp.147 - 154 MATERIALS SCIENCE-POLAND 21 1 147 154 scie scopus 000186074600016 2-s2.0-1042288129 Materials Science, Multidisciplinary Materials Science Article MEDIA cobalt magnetic field perpendicular anisotropy electrodeposition