Song, JH Choi, DK Choi, WK 2024-01-21T09:44:41Z 2024-01-21T09:44:41Z 2021-09-01 2002-11 0168-583X https://pubs.kist.re.kr/handle/201004/139103 CO2 cluster ions are irradiated at the acceleration voltage of 25 kV to remove hillocks on indium tin oxide (ITO) surfaces and thus to attain highly smooth surfaces. CO2 monomer ions are also bombarded on the ITO surfaces at the same acceleration voltage to compare sputtering phenomena. From the atomic force microscope results, the irradiation of monomer ions makes the hillocks sharper and the surfaces rougher from 1.31 to 1.6 nm in roughness. On the other hand, the irradiation of CO2 cluster ions reduces the height of hillocks and planarize the ITO surfaces as smooth as 0.92 nm in roughness. This discrepancy could be explained by large lateral sputtering yield of the cluster ions and re-deposition of sputtered particles by the impact of the cluster ions on surfaces. (C) 2002 Elsevier Science B.V. All rights reserved. English ELSEVIER SCIENCE BV FILMS Indium tin oxide surface smoothing by gas cluster ion beam Article 10.1016/S0168-583X(02)01296-X 1 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, v.196, no.3-4, pp.275 - 278 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 196 3-4 275 278 scie scopus 000179300300009 2-s2.0-0036849805 Instruments & Instrumentation Nuclear Science & Technology Physics, Atomic, Molecular & Chemical Physics, Nuclear Instruments & Instrumentation Nuclear Science & Technology Physics Article FILMS cluster ions surface smoothing hillocks ITO lateral sputtering