Kim, HK Seong, TY Yoon, YS 2024-01-21T09:45:44Z 2024-01-21T09:45:44Z 2021-09-01 2002-10-24 0378-7753 https://pubs.kist.re.kr/handle/201004/139122 The effect of platinum co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V2O5 films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V2O5 films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V2O5 cathode film exhibits better cycleability than an undoped V2O5 cathode film. This is due to the absence of short-range order, which is generally present in undoped V2O5 cathode films. Possible explanations are given to describe the dependence of the cycleability V2O5 films on the platinum rf power and the growth mechanism of the V2O5 film. (C) 2002 Elsevier Science B.V. All rights reserved. English ELSEVIER ELECTROCHEMICAL-BEHAVIOR CATHODE FABRICATION Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films Article 10.1016/S0378-7753(02)00343-9 1 JOURNAL OF POWER SOURCES, v.112, no.1, pp.67 - 75 JOURNAL OF POWER SOURCES 112 1 67 75 scie scopus 000179018400010 2-s2.0-0037167970 Chemistry, Physical Electrochemistry Energy & Fuels Materials Science, Multidisciplinary Chemistry Electrochemistry Energy & Fuels Materials Science Article ELECTROCHEMICAL-BEHAVIOR CATHODE FABRICATION platinum co-sputtering V2O5 cycleability micro-power source short-range order thin-film battery