Lee, WY Shin, KH Choi, BC Bland, JAC 2024-01-21T11:10:11Z 2024-01-21T11:10:11Z 2021-09-04 2002-02 0304-8853 https://pubs.kist.re.kr/handle/201004/139839 The dynamic magnetisation reversal behaviour of polycrystalline Ni80Fe20 films (thickness 60 and 200 Angstrom) was studied in the temperature range 90-300 K. The loop area A is found to follow the scaling relation A proportional to H(0)(x)Omega(beta)T(-gamma) with alpha approximate to 0.9, beta approximate to 0.8, and gamma approximate to 0.38 for both thicknesses. The exponents alpha and beta are found to be independent of the temperature, indicating that the dynamic reversal mechanism is unchanged in this temperature range. (C) 2002 Elsevier Science B.V. All rights reserved. English ELSEVIER SCIENCE BV CO FILMS HYSTERESIS SYSTEMS CU(001) Magnetisation reversal dynamics in Ni80Fe20 thin films Article 10.1016/S0304-8853(01)00586-8 1 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.239, no.1-3, pp.103 - 105 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 239 1-3 103 105 scie scopus 000175187300035 2-s2.0-0036465232 Materials Science, Multidisciplinary Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper CO FILMS HYSTERESIS SYSTEMS CU(001) magnetisation reversal dynamics magnetisation reversal process dynamic scaling relation