Kim, HK Seong, TY Lim, JH Cho, WI Yoon, YS 2024-01-21T11:14:26Z 2024-01-21T11:14:26Z 2021-09-05 2001-12-15 0378-7753 https://pubs.kist.re.kr/handle/201004/139912 The electrochemical and structural properties of cobalt oxide films which are deposited at different sputtering gas-ratios Of O-2/(Ar + O-2) are investigated. In order to examine the electrochemical properties of the as-deposited films, all solid-state thin-film. supercapacitors (TFSCs) are fabricated. There Consist Of Co3O4 electrodes and an amorphous LiPON thin-film electrolyte. It is shown that the capacitance behaviour of the Co3O4/LiPON/Co3O4 TFSCs is similar to bulk-type supercapacitor behaviour. It is further shown that the electrochemical behaviour of the TFSCs is dependent on the sputtering gas-ratios. The gas-ratio dependence of the capacitance of the oxide electrode films is discussed based on X-ray diffraction (XRD) and electrical results for the Co3O4 films. (C) 2001 Published by Elsevier Science B.V. English ELSEVIER IN-SITU BEHAVIOR NICO2O4 Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors Article 10.1016/S0378-7753(01)00864-3 1 JOURNAL OF POWER SOURCES, v.102, no.1-2, pp.167 - 171 JOURNAL OF POWER SOURCES 102 1-2 167 171 scie scopus 000172597000024 2-s2.0-0035702636 Chemistry, Physical Electrochemistry Energy & Fuels Materials Science, Multidisciplinary Chemistry Electrochemistry Energy & Fuels Materials Science Article IN-SITU BEHAVIOR NICO2O4 thin-film supercapacitor Co3O4 LiPON electrolyte gas-ratio capacitance