<?xml version="1.0" encoding="utf-8" standalone="no"?>
<dublin_core schema="dc">
<dcvalue element="contributor" qualifier="author">Lee,&#x20;YH</dcvalue>
<dcvalue element="contributor" qualifier="author">Ju,&#x20;BK</dcvalue>
<dcvalue element="contributor" qualifier="author">Kim,&#x20;DH</dcvalue>
<dcvalue element="contributor" qualifier="author">Oh,&#x20;MH</dcvalue>
<dcvalue element="date" qualifier="accessioned">2024-01-21T12:36:35Z</dcvalue>
<dcvalue element="date" qualifier="available">2024-01-21T12:36:35Z</dcvalue>
<dcvalue element="date" qualifier="created">2021-09-05</dcvalue>
<dcvalue element="date" qualifier="issued">2001-04</dcvalue>
<dcvalue element="identifier" qualifier="issn">0018-9383</dcvalue>
<dcvalue element="identifier" qualifier="uri">https:&#x2F;&#x2F;pubs.kist.re.kr&#x2F;handle&#x2F;201004&#x2F;140591</dcvalue>
<dcvalue element="description" qualifier="abstract">We&#x20;introduced&#x20;thin-film&#x20;electroluminescent&#x20;cells&#x20;(TFEL)&#x20;with&#x20;a&#x20;new&#x20;multilayered-BaTiO3&#x20;layer&#x20;for&#x20;the&#x20;low-voltage&#x20;driven&#x20;devices.&#x20;We&#x20;begin&#x20;by&#x20;simulating&#x20;the&#x20;basic&#x20;parameters&#x20;for&#x20;TFEL&#x20;devices&#x20;in&#x20;eletrostatic&#x20;boundary&#x20;condition&#x20;and&#x20;point&#x20;out&#x20;how&#x20;the&#x20;insulator&#x20;parameters&#x20;influences&#x20;on&#x20;the&#x20;typical&#x20;operating&#x20;properties&#x20;of&#x20;the&#x20;devices.&#x20;Next,&#x20;we&#x20;performed&#x20;the&#x20;voltage&#x20;accelerated&#x20;breakdown&#x20;testing&#x20;of&#x20;the&#x20;multilayered-BaTiO3&#x20;having&#x20;both&#x20;high&#x20;dielectric&#x20;constant&#x20;and&#x20;high&#x20;breakdown&#x20;strength.&#x20;The&#x20;time-zero-breakdown&#x20;distribution&#x20;is&#x20;shown&#x20;to&#x20;be&#x20;dependent&#x20;on&#x20;surface&#x20;roughness,&#x20;while&#x20;the&#x20;long-term&#x20;failure&#x20;studied&#x20;by&#x20;time-dependent-dielectric&#x20;breakdown&#x20;technique&#x20;at&#x20;high&#x20;field&#x20;is&#x20;dependent&#x20;on&#x20;the&#x20;bulk&#x20;characteristics,&#x20;i,e,,&#x20;transition&#x20;layers&#x20;within&#x20;m-BT&#x20;films.&#x20;Thirdly,&#x20;the&#x20;TFEL,&#x20;devices&#x20;were&#x20;prepared&#x20;using&#x20;the&#x20;multilayered-BaTiO3&#x20;as&#x20;dielectric&#x20;materials.&#x20;We&#x20;observed&#x20;a&#x20;decrease&#x20;of&#x20;turn-on&#x20;voltage&#x20;with&#x20;increasing&#x20;thickness&#x20;and&#x20;the&#x20;increase&#x20;of&#x20;the&#x20;maximum&#x20;over&#x20;voltage.&#x20;Finally,&#x20;typical&#x20;symmetric&#x20;capacitance-voltage&#x20;(C-V)&#x20;and&#x20;internal&#x20;charge-phosphor&#x20;field&#x20;characteristics&#x20;were&#x20;obtained&#x20;for&#x20;the&#x20;device&#x20;with&#x20;thin&#x20;m-BT&#x20;layers.&#x20;With&#x20;increasing&#x20;thickness&#x20;of&#x20;m-BT&#x20;the&#x20;significant&#x20;asymmetry&#x20;with&#x20;respect&#x20;to&#x20;the&#x20;applied&#x20;voltage&#x20;polarity&#x20;was&#x20;observed.&#x20;This&#x20;is&#x20;a&#x20;main&#x20;difference&#x20;as&#x20;compared&#x20;with&#x20;the&#x20;symmetric&#x20;characteristics&#x20;of&#x20;conventional&#x20;TFEL&#x20;devices&#x20;with&#x20;low&#x20;dielectric&#x20;constant&#x20;insulators.&#x20;The&#x20;experimental&#x20;results&#x20;indicate&#x20;the&#x20;fact&#x20;that&#x20;a&#x20;selection&#x20;of&#x20;the&#x20;thickness&#x20;of&#x20;upper&#x20;m-BT&#x20;and&#x20;their&#x20;deposition&#x20;process&#x20;would&#x20;strongly&#x20;affect&#x20;the&#x20;interfacial&#x20;characteristics&#x20;as&#x20;well&#x20;as&#x20;hulk&#x20;characteristics&#x20;of&#x20;an&#x20;as-grown&#x20;ZnS&#x20;:Pr,&#x20;Ce&#x20;layer.</dcvalue>
<dcvalue element="language" qualifier="none">English</dcvalue>
<dcvalue element="publisher" qualifier="none">IEEE-INST&#x20;ELECTRICAL&#x20;ELECTRONICS&#x20;ENGINEERS&#x20;INC</dcvalue>
<dcvalue element="subject" qualifier="none">BREAKDOWN</dcvalue>
<dcvalue element="title" qualifier="none">Comprehensive&#x20;understandings&#x20;on&#x20;the&#x20;high&#x20;dielectric&#x20;constant&#x20;insulating&#x20;layers&#x20;for&#x20;alternating-current&#x20;thin-film&#x20;electroluminescent&#x20;devices</dcvalue>
<dcvalue element="type" qualifier="none">Article</dcvalue>
<dcvalue element="description" qualifier="journalClass">1</dcvalue>
<dcvalue element="identifier" qualifier="bibliographicCitation">IEEE&#x20;TRANSACTIONS&#x20;ON&#x20;ELECTRON&#x20;DEVICES,&#x20;v.48,&#x20;no.4,&#x20;pp.653&#x20;-&#x20;660</dcvalue>
<dcvalue element="citation" qualifier="title">IEEE&#x20;TRANSACTIONS&#x20;ON&#x20;ELECTRON&#x20;DEVICES</dcvalue>
<dcvalue element="citation" qualifier="volume">48</dcvalue>
<dcvalue element="citation" qualifier="number">4</dcvalue>
<dcvalue element="citation" qualifier="startPage">653</dcvalue>
<dcvalue element="citation" qualifier="endPage">660</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scie</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scopus</dcvalue>
<dcvalue element="identifier" qualifier="wosid">000167985100005</dcvalue>
<dcvalue element="identifier" qualifier="scopusid">2-s2.0-0035307338</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Engineering,&#x20;Electrical&#x20;&amp;&#x20;Electronic</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Physics,&#x20;Applied</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Engineering</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Physics</dcvalue>
<dcvalue element="type" qualifier="docType">Article</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">BREAKDOWN</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">BaTiO3</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">electroluminescence</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">insulating&#x20;films</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">TFEL</dcvalue>
</dublin_core>
