Kim, YW Kim, GH Han, S Lee, Y Cho, J Rhee, SY 2024-01-21T12:43:36Z 2024-01-21T12:43:36Z 2021-09-04 2001-02-02 0257-8972 https://pubs.kist.re.kr/handle/201004/140714 In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse. (C) 2001 Published by Elsevier Science B.V. All rights reserved. English ELSEVIER SCIENCE SA SURFACE MODIFICATION Measurement of sheath expansion in plasma source ion implantation Article 10.1016/S0257-8972(00)01035-5 1 SURFACE & COATINGS TECHNOLOGY, v.136, no.1-3, pp.97 - 101 SURFACE & COATINGS TECHNOLOGY 136 1-3 97 101 scie scopus 000166464900021 2-s2.0-0035254888 Materials Science, Coatings & Films Physics, Applied Materials Science Physics Article; Proceedings Paper SURFACE MODIFICATION plasma source ion implantation time-dependent sheath ion wave Langmuir probe