Baik, ES Baik, YJ Lee, SW Jeon, D 2024-01-21T13:05:20Z 2024-01-21T13:05:20Z 2021-09-05 2000-12-01 0040-6090 https://pubs.kist.re.kr/handle/201004/140839 Aligned diamond whiskers were formed by air plasma etching of polycrystalline diamond films. A small amount of Mo was deposited on the diamond substrate for use as an etch-resistant mask, and the negatively biased substrate was etched by RF or DC plasma. The shape and the density of the whiskers depended on the etching parameters, such as substrate temperature, chamber pressure, bias voltage, etching power, and the amount of Mo. If the substrate temperature was high, for example, the whiskers became thick. With the optimum conditions, we could fabricate diamond whiskers as thin as 60 nm with a density of 50/mum(2). (C) 2000 Elsevier Science B.V. All rights reserved. English ELSEVIER SCIENCE SA FIELD-EMISSION ELECTRON ARRAYS FILMS Fabrication of diamond nano-whiskers Article 10.1016/S0040-6090(00)01431-0 1 THIN SOLID FILMS, v.377, pp.295 - 298 THIN SOLID FILMS 377 295 298 scie scopus 000166024600051 2-s2.0-18844465851 Materials Science, Multidisciplinary Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper FIELD-EMISSION ELECTRON ARRAYS FILMS diamond film fibers dry etching field emitters