Pasquale, M Infortuna, A Martino, L Sasso, C Beatrice, C Lim, SH 2024-01-21T14:03:11Z 2024-01-21T14:03:11Z 2021-09-05 2000-06 0304-8853 https://pubs.kist.re.kr/handle/201004/141351 The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 mu m thick films are produced on 200 mu m thick Si (100) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at% is determined for sensor applications requiring magnetic softness and stress sensitivity. (C) 2000 Elsevier Science B.V. All rights reserved. English ELSEVIER SCIENCE BV MAGNETOSTRICTION Magnetic properties of TbFe thin films under applied stress Article 10.1016/S0304-8853(00)00283-3 1 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.215, pp.769 - 771 JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 215 769 771 scie scopus 000087873100222 2-s2.0-0033704942 Materials Science, Multidisciplinary Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper MAGNETOSTRICTION thin films magnetostriction sensors magnetic measurements stress effects