Ahn, KD Chung, CM 2024-01-21T15:11:06Z 2024-01-21T15:11:06Z 2021-09-05 1999-08 1022-1360 https://pubs.kist.re.kr/handle/201004/142030 Synthesis and properties of photoacid generating polymers based on four sulfonyloxymaleimides (RsOMI), N-(tosyloxy)maleimide (TsOMI), N-(methanesulfonyloxy)maleimide (MsOMI), N-(trifluoromethanesulfonyloxy)maleimide (TfOMI), and N-(10-camphorsulfonyloxy)maleimide (CsOMI) are described. The RsOMI polymers photochemically produce corresponding sulfonic acids (RsOH), TsOH, MsOH, TfOH and 10-camphorsulfonic acid (CSA) which can catalyze deprotection of the acid-labile t-BOC groups in the same polymer chains via a chemical amplification process. The photoacid generating polymers with concurrent acid-labile groups offer great potential for applications in functional transformation and photoimaging. English WILEY-V C H VERLAG GMBH SINGLE-COMPONENT RESISTS CHEMICAL AMPLIFICATION COPOLYMERS POLYMERIZATION CHEMISTRY SYSTEMS ROUTE ACID Photoacid-generating sulfonyloxymaleimide polymers and their application to photoimaging Article 10.1002/masy.19991420115 1 MACROMOLECULAR SYMPOSIA, v.142, pp.145 - 157 MACROMOLECULAR SYMPOSIA 142 145 157 scie scopus 000083646300014 2-s2.0-0033450687 Polymer Science Polymer Science Article SINGLE-COMPONENT RESISTS CHEMICAL AMPLIFICATION COPOLYMERS POLYMERIZATION CHEMISTRY SYSTEMS ROUTE ACID photoacid generation sulfonyloxymaleimide polymeric photoacid generator photoimaging chemical amplification photopolymers photoresist