김성동 이정중 임상호 김희중 2024-01-21T16:06:09Z 2024-01-21T16:06:09Z 2022-01-10 1999-01 0285-0192 https://pubs.kist.re.kr/handle/201004/142512 Reactive ion etching characteristics of permalloy thin films Article 3 日本應用磁氣學會誌 = Journal of the magnetics society of Japan, v.23, no.1-2, pp.252 - 254 日本應用磁氣學會誌 = Journal of the magnetics society of Japan 23 1-2 252 254 reactive ion etching permalloy thin films etching rate etching damage coercivity