Choi, SC Park, YW Choi, WK Kim, KH Cho, JS Han, S Cho, J Jung, S Han, YG Yoo, BK Jung, HJ Koh, SK 2024-01-21T16:31:25Z 2024-01-21T16:31:25Z 2021-09-03 1998-12 0021-4922 https://pubs.kist.re.kr/handle/201004/142711 High-quality ZnO film and highly wettable polymethylmethacrylate (PMMA) are obtained by using a keV inn beam. ZnO films are grown on glass substrates by ion beam sputter deposition. changing the oxygen/argon gas ratio, ion beam energy, and substrate temperature. Physical properties of ZnO films were investigated by X-ray diffraction, Rutherford backscattering spectroscopy, and the Van der Pauw method. All the films show a strong preferred orientation along the c-axis. The electrical resistivity is varied from 10(-3) to 10(6) Omega cm and its dependence on the deposition parameters is discussed. The PMMA surface was modified by the ion-assisted reaction technique. Ion dose, ion energy, and oxygen gas now rate are varied from 5 x 10(15) to 1 x 10(17) ions/cm(2), from 0.6 to 1.2 kV, and from 0 to 8 ml/min, respectively. A highly wettable PMMA surface can be obtained by irradiating oxygen ions in an oxygen gas environment. X-ray photoelectron spectroscopic analysis shows that hydrophilic groups are formed on the surface of PMMA. English JAPAN J APPLIED PHYSICS Thin film growth and surface modification by keV ion beam Article 10.1143/JJAP.37.6984 1 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.37, no.12B, pp.6984 - 6990 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 37 12B 6984 6990 scie scopus 000078699200064 2-s2.0-0002820783 Physics, Applied Physics Article; Proceedings Paper ion beam modification ion beam sputter deposition ZnO thin film polymethylmethacrylate wettability