Cho, KJ Lee, JK Jung, HJ Park, JW 2024-01-21T17:08:15Z 2024-01-21T17:08:15Z 2021-09-03 1998-05 0734-2101 https://pubs.kist.re.kr/handle/201004/143101 Microstructure dependencies on the ferroelectric properties of SrBi2Ta2O9 (SBT) thin films were observed by changing the sputtering pressure in the rf magnetron sputtering technique. The microstructure and the crystal orientations were determined by the compositional change of the films, which was controlled by the scattering behaviors during sputter depositions. The good ferroelectric hysteresis loop behavior was due to the stoichiometric composition and the layered perovskite structure of the SET thin films. On the other hand, nonstoichiometric SET films had small grains of pyrochlore structure and linear dielectric behavior. (C) 1998 American Vacuum Society. English A V S AMER INST PHYSICS FATIGUE Microstructure-dependent ferroelectric properties of SrBi2Ta2O9 thin films fabricated by radio frequency magnetron sputtering Article 10.1116/1.581270 1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.16, no.3, pp.1258 - 1261 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 16 3 1258 1261 scie scopus 000074150400069 2-s2.0-0000172886 Materials Science, Coatings & Films Physics, Applied Materials Science Physics Article; Proceedings Paper FATIGUE ferroelectric