Baik, Young Joon LEE, JAE KAP Lee, Wook Seong EUN, KWANG YONG 2024-01-21T17:12:07Z 2024-01-21T17:12:07Z 2021-09-03 1998-04 0884-2914 https://pubs.kist.re.kr/handle/201004/143168 The deposition area of diamond film is increased by applying a geometry of multiple cathodes and a single anode in direct current (dc) plasma assisted chemical vapor deposition (PACVD). Each cathode is made of Ta and connected independently to its own de power supply. The operating pressure is 1.3 x 10(4) Pa (100 Torr), and methane-hydrogen mixed gas is used as reaction gas. The voltage and the current applied to each cathode are 650 V and 4 A, respectively. The transition from a diffuse glow to an are is prevented by maintaining cathode temperatures above 2000 degrees C, which inhibits carbon deposition on the cathodes, Translucent diamond film of 3 in, diameter, thicker than 200 mu m, is grown using seven cathodes with 3% CH4-H-2 mixed gas for 110 h. The deposition area can be increased further by increasing the number of cathodes. English MATERIALS RESEARCH SOCIETY Large size plasma generation using multicathode direct current geometry for diamond deposition Article 10.1557/JMR.1998.0131 1 JOURNAL OF MATERIALS RESEARCH, v.13, no.4, pp.944 - 946 JOURNAL OF MATERIALS RESEARCH 13 4 944 946 N scie scopus 000073906500032 2-s2.0-0032046860 Materials Science, Multidisciplinary Materials Science Article CHEMICAL VAPOR-DEPOSITION DC DISCHARGE GROWTH FILMS GAS diamond