Bougrove, GE Kralkina, EA Antonova, TB Choi, WK Jung, HJ Koh, SK Kondranin, SG 2024-01-21T17:15:23Z 2024-01-21T17:15:23Z 2021-09-03 1998-03 0374-4884 https://pubs.kist.re.kr/handle/201004/143224 The excitation mechanisms of Xe atoms in low-pressure plasmas was analyzed in the frame of the collisional radiative model. The calculations were carried out for the following plasma parameters: an atom concentration in the range of n(0) = 10(10) - 10(16) cm(-3) a degree of plasma ionization in the range of n(+)/n(0) = 10(-5) - 1, and an optical plasma thickness in the range of theta = 1(1) - 10(3). It was assumed that the electron energy distribution could be described by a Maxwell function with a temperature T-epsilon = 0.5-20 eV. For all considered plasma parameters the obtained results exhibited essentially the non-equilibrium character of atoms distribution over the excited states. English KOREAN PHYSICAL SOC The mathematical simulation of excitation processes in xenon low-pressure plasmas Article 1 JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.32, no.3, pp.195 - 199 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 32 3 195 199 scie scopus 000072549300001 2-s2.0-0032382550 Physics, Multidisciplinary Physics Article; Proceedings Paper Xenon plasma