Ahn, K.-D. Rang, J.-H. Lee, C.-W. Kim, J.-M. Han, D.-K. Lee, J.-H. Cho, I. Moon, S.-Y. Koo, J.-S. Lee, S.-K. 2024-01-21T17:42:21Z 2024-01-21T17:42:21Z 2021-09-02 1998-01 0914-9244 https://pubs.kist.re.kr/handle/201004/143443 [No abstract available] English Tokai University New alicyclic polymers based on protected dinorbornene monomers for application as deep UV resists Article 10.2494/photopolymer.11.499 1 Journal of Photopolymer Science and Technology, v.11, no.3, pp.499 - 504 Journal of Photopolymer Science and Technology 11 3 499 504 scopus 2-s2.0-0001474362 Article Alicyclic polymers Arf resist Protected dinorbornene polymers