Lee, KR Kim, MG Cho, SJ Eun, KY Seong, TY 2024-01-21T18:01:35Z 2024-01-21T18:01:35Z 2021-09-04 1997-10-31 0040-6090 https://pubs.kist.re.kr/handle/201004/143542 Mechanical properties and atomic bond structure of Si incorporated diamond-like carbon (Si-DLC) films were investigated. The films were deposited by 13.56 MHz r.f.-plasma-assisted chemical vapour deposition (r.f.-PACVD), using mixtures of benzene and diluted silane (SiH/H-2 10:90) as the reaction gases. Si concentration in the film was varied from 0 to 17 atomic (at.)% by increasing the diluted silane fraction from 0 to 95%. It was observed that the mechanical properties of the film changed significantly when the Si concentration was less than 5 at.%. In this concentration range, hardness, residual stress and elastic constants increased with increasing Si concentration. For higher concentrations of Si, the mechanical properties showed saturated behaviour. The changes of the mechanical properties are discussed in terms of the content of three-dimensional inter-links of the atomic bond network. (C) 1997 Elsevier Science S.A. English ELSEVIER SCIENCE SA SILICON-CARBIDE FILMS AMORPHOUS-CARBON TRIBOLOGICAL PROPERTIES ATOMIC-STRUCTURE THIN-FILMS COATINGS HARDNESS WEAR Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition Article 10.1016/S0040-6090(97)00411-2 1 THIN SOLID FILMS, v.308, pp.263 - 267 THIN SOLID FILMS 308 263 267 scie scopus 000071553400050 2-s2.0-0031245446 Materials Science, Multidisciplinary Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Materials Science Physics Article; Proceedings Paper SILICON-CARBIDE FILMS AMORPHOUS-CARBON TRIBOLOGICAL PROPERTIES ATOMIC-STRUCTURE THIN-FILMS COATINGS HARDNESS WEAR diamond-like carbon Si incorporated films