Han, SM Yu, SC Kim, WT Han, SH Kim, HJ 2024-01-21T18:06:27Z 2024-01-21T18:06:27Z 2021-09-05 1997-09 0018-9464 https://pubs.kist.re.kr/handle/201004/143624 The structure and magnetic properties of Fe-Si3N4 thin films fabricated by a co-sputtering technique mere studied by X-ray diffractometry and magnetometry. With increasing area fraction of Si3N4 pieces on Fe target, magnetization of the films decreased due to reduced Fe content and reduced grain size of bce crystalline phase, Temperature dependence and field dependence of magnetization of co-sputtered thin films can be explained bg a mixture of two types of particles showing paramagnetism and ferromagnetism. English IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC ALLOYS Two magnetic phases in the co-sputtered Fe-Si3N4 thin film Article 10.1109/20.619513 1 IEEE TRANSACTIONS ON MAGNETICS, v.33, no.5, pp.3610 - 3612 IEEE TRANSACTIONS ON MAGNETICS 33 5 3610 3612 scie scopus A1997XW56500036 2-s2.0-0031221625 Engineering, Electrical & Electronic Physics, Applied Engineering Physics Article; Proceedings Paper ALLOYS Fe-Si3N4 thin film magnetic