Turcu, I.C.E. Mann, C.M. Moon, S.W. Allott, R. Lisi, N. Maddison, B.J. Huq, S.E. Kim, N.S. 2024-01-21T18:40:35Z 2024-01-21T18:40:35Z 2021-09-02 1997-02 0167-9317 https://pubs.kist.re.kr/handle/201004/143972 Soft x-rays with 1nm wavelength are used to print 48μm deep structures in chemically amplified resist. A multiple exposure/development technique reduces the x-ray exposure time to a total of 10min when using a compact, laser-plasma x-ray source. The use of an embedded mask generates a true three dimensional structure. Only 2μm thick x-ray masks are used with such soft x-rays. A 2.5THz waveguide cavity is fabricated using this novel process. English Elsevier Deep, three dimensional lithography with a laser-plasma x-ray source at 1nm wavelength Article 10.1016/S0167-9317(96)00151-7 1 Microelectronic Engineering, v.35, no.1-4, pp.541 - 544 Microelectronic Engineering 35 1-4 541 544 N scopus 2-s2.0-0031073199 Article Cavity resonators Laser produced plasmas Masks Photoresists Three dimensional Waveguide components X ray lithography Laser plasma x ray source Soft x rays Three dimensional lithography Waveguide cavity X ray exposure time Microelectronic processing three dimensional lithography