Yom, SS Wang, CH Kim, YT 2024-01-21T19:04:46Z 2024-01-21T19:04:46Z 2021-09-05 1997-01 1058-4587 https://pubs.kist.re.kr/handle/201004/144153 We deposited PbTiO3 thin films using beta-diketonate complex of Pb(tmhd)(2) and titanium-isopropoxide as source precursors at substrate temperature range from 430 degrees C to 630 degrees C by MOCVD. The PbTiO3 films on Pt/Ti/SiO2/Si substrates at above 500 degrees C showed polycrystalline behavior. The PbTiO3 films on Pt/Ti/SiO2/Si and fused silica glass substrates grown at 430 degrees C included abnormal circular-shaped crystalline phases which were randomly embedded in amorphous PbTiO3 film. From Auger electron spectroscopy, transmission electron microscopy and micro-Raman spectroscopy results, the circular-shaped phase is an aggregation of micro-crystalline PbTiO3 phases which are embedded in the amorphous matrix. English GORDON BREACH SCI PUBL LTD CHEMICAL-VAPOR-DEPOSITION LOW-TEMPERATURE P-SI ELECTRICAL-PROPERTIES STRUCTURAL-PROPERTIES OPTICAL-PROPERTIES RAMAN-SPECTRA GLASS Formation of circular-shaped crystalline phases embedded in amorphous PbTiO3 thin films grown by MOCVD Article 10.1080/10584589708019979 1 INTEGRATED FERROELECTRICS, v.14, no.1-4, pp.77 - 83 INTEGRATED FERROELECTRICS 14 1-4 77 83 scie scopus A1997WR71400010 2-s2.0-0031334281 Engineering, Electrical & Electronic Physics, Applied Physics, Condensed Matter Engineering Physics Article; Proceedings Paper CHEMICAL-VAPOR-DEPOSITION LOW-TEMPERATURE P-SI ELECTRICAL-PROPERTIES STRUCTURAL-PROPERTIES OPTICAL-PROPERTIES RAMAN-SPECTRA GLASS MOCVD PbTiO3 films micro-crystalline