Moon, SW Mann, CM Maddison, BJ Turcu, ICE Allot, R Huq, SE Lisi, N 2024-01-21T19:13:49Z 2024-01-21T19:13:49Z 2021-09-01 1996-09-12 0013-5194 https://pubs.kist.re.kr/handle/201004/144306 A novel process using embedded x-ray masks that allows the fabrication of 3D terahertz waveguide components is demonstrated. X-rays produced by a laser plasma source are used to expose a chenically amplified resist. To produce structures with the required depth (similar to 50 mu m) a cyclic exposure and development technique is used. A representative waveguide cavity intended for operation at 2.5THz is realised. English IEE-INST ELEC ENG Terahertz waveguide components fabricated using a 3D x-ray microfabrication technique Article 10.1049/el:19961166 1 ELECTRONICS LETTERS, v.32, no.19, pp.1794 - 1795 ELECTRONICS LETTERS 32 19 1794 1795 scie scopus A1996VJ62800036 Engineering, Electrical & Electronic Engineering Article x-ray lithography optical waveguides waveguides